About Silicon Nitride Si3N4 Powder:
Silicon nitride is a compound of silicon and nitrogen. Si3n4 is the most thermodynamic stable in silicon nitride. It is white, high melting point solid, relative chemical inert, diluted HF and hot H2SO4 attack. It works very hard (8.5 on the MoHS), which has high thermal stability. By the way, silicon nitride cost is also cheap.
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Silicon nitride powder is an inorganic substance, and the chemical formula is Si3N4. It is an important structural ceramic material with high hardness, which has lubricity and wear resistance, an atomic crystal; antioxidation at high temperatures. Moreover, it can resist the impact of the cold and cold, heated into the air to 1000 ° C or more, and the sharp cooling and then heating, and it will not be broken. It is precise because silicon nitride ceramics have such excellent properties, and people often utilize them to make mechanical components such as bearings, air turbine blades, mechanical seals, permanent molds. If silicon nitride ceramics resistant to high temperatures and are not easily transferred, the heat-inspiration surface of the engine member can be improved, not only the quality, but also saves fuel, but also improves thermal efficiency.
Silicon nitride is difficult to produce as a bulk material—it cannot be heated over 1850 °C, which is well below its melting point, due to dissociation to silicon and nitrogen. Therefore, the application of conventional hot press sintering techniques is problematic. Bonding of silicon nitride powders can be achieved at lower temperatures through adding additional materials (sintering aids or "binders") which commonly induce a degree of liquid phase sintering. A cleaner alternative is to use spark plasma sintering where heating is conducted very rapidly (seconds) by passing pulses of electric current through the compacted powder. Dense silicon nitride compacts have been obtained by this technique at temperatures 1500–1700 °C. Feel free to send an inquiry to get the latest price if you would like to buy Silicon Nitride Si3N4 Powder in bulk.
Product Characteristics of Silicon Nitride Si3N4 Powder:
Superior thermal shock resistance
Excellent wear resistance
Good fracture toughness
Mechanical fatigue and creep resistance
Good oxidation resistance
Specification of Silicon Nitride Si3N4 Powder:
Product Name: Silicon Nitride
Particle Size: 0.5um-1um (α phase)
Chemical Composition of Silicon Nitride Si3N4 Powder:
How is Silicon Nitride Si3N4 Powder produced?
The hexagonal β-Si3N4 can directly carry out silicon nitride and nitrogen can be carried out in a 100-1400 ° C.
SiCL4 (L) + 6 NH3 (g) → Si (NH) 2 (S) + 4 NH4Cl (S) under conditions of 0 ° C
3 Si (NH) 2 (S) → Si3N4 (S) + N2 (g) + 3 H2 (g) under the conditions of 1000 ° C
Or use a carbon thermal reduction reaction in a nitrogen atmosphere of 1400-1450 ° C under a nitrogen atmosphere:
3 SiO2 (S) + 6 C (S) + 2 N2 (g) → Si3N4 (S) + 6 CO (g)
However, if the purity of silicon raw materials used will cause silicon nitride produced containing impurity silicate and iron. The silicon nitride synthesized by diamine decomposing is an amorphous shape, and it is necessary to further do an annealing treatment in nitrogen at 1400-1500 ° C to convert it into crystalline powder, and diamine decomposition is only important. Commercially in nitriding method to produce silicon nitride. The carbon-thermal reduction reaction is the simplest way to produce silicon nitride is also the most cost-effective means of manufacturing a silicon powder in industrial.
The electron-level silicon nitride film is made by chemical vapor deposition or plasma enhanced chemical vapor deposition techniques:
3 SiH4 (G) + 4 NH3 (g) → Si3N4 (S) + 12 H2 (g)
3 SiCL4 (G) + 4 NH3 (g) → Si3N4 (S) + 12 HCl (g)
3 SiCL2H2 (G) + 4 NH3 (g) → Si3N4 (S) + 6 HCl (g) + 6 H2 (g)
If you want to deposit silicon nitride on the semiconductor substrate, there are two methods available for use:
The vertical or horizontal tube furnace is performed at a relatively high temperature using low-pressure chemical vapor deposition techniques.
Plasma enhanced chemical vapor deposition techniques are carried out at a relatively low temperature in vacuum conditions.
The cell parameters of silicon nitride are different from single textile silicon. Therefore, depending on the deposition method, the generated silicon nitride film will generate tension or stress. In particular, when using plasma-enhanced chemical vapor deposition techniques, tension can be reduced by adjusting deposition parameters.
The silica was prepared by soluble gel, and then the silicon nanowires were treated with silica gel thereby in which carbon-thermal reduction method and nitride were treated. The special carbon particles in silica gel are produced by glucose at 1200-1350 ° C.
Applications of Silicon Nitride Si3N4 Powder:
Manufacturing structure: such as metallurgy, machinery, aviation, aerospace.
Surface treatment of metals and other materials: such as molds, cutting tools, turbine blades.
Composites: such as metal, ceramic and graphite composite, rubber, plastic
Colorless, transparent self-lubricating wear nanoparticle membrane for mobile phones;
Advanced surface protection such as a car;
Ball valve and part;
Metallurgical, aviation, chemical, energy and machinery industry make parts such as bead/roller bearings, sleeves, valves and other wear;
Making cutting tools, molds, cylindrical wall coating, turbine rotors and blades;
Manufacturing composite materials such as ceramic, graphite, rubber, metal, adhesive, etc.
Nozzle, rocket and missile spray pipe.
Packing & Shipping of Silicon Nitride Si3N4 Powder :
We have many different kinds of packing which depends on the silicon nitride Si3N4 powder quantity.
Silicon nitride Si3N4 powder packing: vacuum packing, 100g, 500g or 1kg/bag, 25kg/barrel, or as your request.
Silicon nitride Si3N4 powder shipping: could be shipped out by sea , by air, by express as soon as possible once payment receipt.