Silicon Nitride Powder

(Silicon Nitride Powder)

Silicon nitride poda ichena, yakakwirira kunyunguduka nzvimbo yakasimba iyo ine makemikari inert uye thermodynamically yakagadzikana. Chinhu chakakosha chemhando dzakasiyana dzekushandisa dzinoda yakanakisa kamuri tembiricha uye yakakwirira tembiricha michina zvivakwa, oxidation kuramba uye creep resistance.

Inozivikanwa nekuoma kwayo uye kusimba, si3n4 poda chinhu chakanakira chemichina yekushandisa inoda simba rakanyanyisa nekuderera kwekuwedzera kwekupisa uye hupenyu hurefu hwebasa. Kusanganiswa kwayo kwakasarudzika kwezvivakwa kunoita kuti ive yakanyanya kudiwa ceramic kuti ishandiswe mumabhengi, turbine blades uye zvimwe zvimiro zvemukati.

SINX STX-100 TECHNICAL CERAMIC (Si3N4) POWDER ndiyo imwe yemhando yepamusoro uye yakanyatsojeka tekinoroji ceramics iripo nhasi. Iyo inopa yakanakisa musanganiswa wemakanika, zvinopisa, uye zvemagetsi zvimiro zvechero ceramic mukirasi yayo.

Dense uye yakasimba, ine yakanyanya kutsemuka kuomarara kwechero tekinoroji ceramic. Iyo zvakare abrasion uye inodzivirira corrosion, zvichiita kuti ive sarudzo yakanaka yezvishandiso zvinosanganisira mitoro inorema uye nharaunda dzakaomarara.

Si3N4 yakakurumbira passivation layer mune semiconductor indasitiri nekuti ine yakaderera diffusion kuramba kumvura uye alkali ion pane silicon dioxide. Iyo zvakare yakanaka kwazvo dielectric uye yakanakisa thermal conductor.

Iyo yepamusoro yeSi3N4 inowanzo dhindwa uchishandisa fluorine plasma. SF6-based, CF4-based uye CHF3-based plasmas inowanzoshandiswa. SF6-based plasmas ine mukana weiyo inokurumidza etch rate, iyo inonyanya kubatsira kune anisotropic SiN nzvimbo.

Iyo slurry inoshandiswa kupinza muSiN CMP inofanirwa kuve yakanyatso sarudza kuderedza kubviswa kweoxyde uye kuchengetedza yakanaka wafer scale nonuniformity. Izvi zvinoda yakaderera kwazvo SiN yekubvisa mwero uye inogoneka kuburikidza nekushandisa yakanyanya kusarudzwa nitride slurry.

(Silicon Nitride Powder)