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1.Chemical Framework of Tungsten Disilicide
1.1 What is Tungsten Disilicide?
Tungsten Disilicide stands as an amazing intermetallic substance, standing for one of the most significant refractory metal silicides in innovative industrial applications. This remarkable product belongs to the remarkable household of shift metal silicides, where tungsten combines with silicon to create a chemically durable substance with outstanding performance attributes. With its molecular formula WSi2 and a molecular weight of 240.011 g/mol, this material has actually captured considerable attention across numerous modern sectors. Tungsten Disilicide usually offers as black-gray or blue-gray tetragonal crystals with a characteristically impressive thickness of approximately 9.3-9.88 g/cm2, making it among the densest ceramic materials readily available for specialized applications. The material’s remarkable thermal and electrical properties have placed it as a vital enabler for cutting-edge technologies in electronic devices, power storage, and high-temperature settings.
Registered under CAS number 12039-88-2, Tungsten Disilicide has a distinct crystalline framework that contributes to its phenomenal mix of residential properties. This material demonstrates extraordinary security under demanding conditions, maintaining its architectural honesty where conventional products would rapidly weaken. The flexible nature of WSi ₂ enables it to be processed into different types, including nano-powders, submicron powders, and micro-sized powders, each customized for specific application requirements. This processability, combined with its integral product excellence, makes Tungsten Disilicide an indispensable option for engineers and designers servicing the most difficult technological troubles.

1.2 How is the Chemical Structure of Tungsten Disilicide?
The advanced chemical architecture of Tungsten Disilicide includes an extremely bought tetragonal crystal system that creates a remarkably stable latticework framework. This specific crystalline arrangement belongs to the space group I4/mmm, where tungsten atoms occupy specific lattice sites while silicon atoms create corresponding structural devices, leading to a highly balanced and thermodynamically durable arrangement. The precisely engineered atomic plan within this crystalline lattice produces a density of 9.3-9.88 g/cm³, adding considerably to the product’s impressive mechanical toughness and thermal security.
The chemical bonding in Tungsten Disilicide represents an interesting crossbreed between metal and covalent attributes, developing what materials researchers usually call an “amazing” intermetallic compound. This one-of-a-kind bonding nature emerges from the electronic communication between tungsten’s d-orbitals and silicon’s sp five crossbreed orbitals, leading to a formidably stable electronic arrangement. The strength of these chemical bonds manifests most obviously in the material’s remarkably high melting point of 2165 °C , which makes certain outstanding efficiency retention at raised temperatures where traditional metals would certainly fall short. This durable atomic setup stays stable throughout an impressively wide thermal variety, making WSi ₂ a perfect candidate for applications in extreme atmospheres.
2 Core Features of Tungsten Disilicide
2.1 What are the Physical Characteristics of Tungsten Disilicide?
Tungsten Disilicide boasts an impressive profile of physical properties that make it a premier material for demanding applications. Its most impressive physical quality is undoubtedly the extremely high melting point of 2165 ° C, which considerably surpasses most standard metals and many sophisticated ceramics. This amazing thermal stability allows WSi to preserve structural integrity in environments that would entirely endanger other materials. The product’s substantial thickness, ranging between 9.3-9.88 g/cm FIVE, adds to its remarkable mechanical effectiveness and resistance to physical deformation under tension.
| Tungsten Silicide Properties | |
| Other Names | tungsten disilicide, WSi2 powder |
| CAS No. | 12039-88-2 |
| Compound Formula | WSi2 |
| Molecular Weight | 240.01 |
| Appearance | Gray Black Powder |
| Melting Point | 2160℃ |
| Boiling Point | N/A |
| Density | 9.3 g/cm3 |
| Solubility in H2O | N/A |
| Exact Mass | 239.904786 |
The electric homes of Tungsten Disilicide additionally improve its versatility as a practical material. With a resistivity of 33.4 ρ/ μΩ · centimeters, it shows acceptable electric conductivity that certifies it for various electronic applications. This particular, incorporated with its exceptional thermal efficiency, makes WSi 2 specifically beneficial in semiconductor technology where managed conductivity and thermal security are essential. The product’s appearance differs from black-gray to blue-gray crystalline powder, with bit dimensions personalized across nano-scale, sub-micron, and micro-scale dimensions to match details application requirements. This versatile morphology enables engineers to specifically tailor the product for whatever from bulk structural elements to innovative thin-film applications.
2.2 What are the Chemical Qualities of Tungsten Disilicide?
The powerful chemical resistance of Tungsten Disilicide stands for one of its most important attributes for commercial applications. This exceptional product demonstrates impressive inertness to many aggressive chemical representatives, consisting of complete insolubility in water and resistance to aqua regia– the notoriously powerful blend of concentrated hydrochloric and nitric acids. Nonetheless, WSi2 does show reactivity towards detailed settings, especially presenting solubility in mixes of nitric and hydrofluoric acids. This selective sensitivity can be purposefully made use of in semiconductor pattern processes where details etchants are required.
A significant element of Tungsten Disilicide’s chemistry involves the intermediate oxidation state of tungsten, which develops a remarkable balance between oxidative and reductive features. This balanced oxidation state adds to the product’s premium stability under numerous ecological problems. Nonetheless, ideal handling preventative measures are essential as WSi2 can undergo strenuous reactions when subjected to strong acids, fluorine, oxidizers, and interhalogen substances. Correct storage space conditions– sealed in inert gas anti-static packaging within completely dry, amazing settings– are essential to prevent unwanted load and preserve optimal dispersion performance. When these guidelines are followed, Tungsten Disilicide supplies extraordinary and reputable lasting chemical stability.

2.3 What are the Practical Characteristics of Tungsten Disilicide?
Beyond its basic physical and chemical features, Tungsten Disilicide possesses extraordinary useful properties that make it important in high-technology applications. The material’s exceptional oxidation resistance sticks out as especially useful, creating a protective surface layer that avoids further degradation at raised temperatures. This robust antioxidant capability guarantees long-term efficiency stability in applications ranging from industrial heating elements to aerospace components. Incorporated with its excellent thermal stability, this oxidation resistance permits WSi ₂ to operate dependably in atmospheres where oxygen is present at high temperatures.
The electrical capability of Tungsten Disilicide has actually been strategically leveraged in microelectronic applications, where it functions as a highly efficient contact product and an adjoining substrate. Its remarkable electric features considerably enhance conductivity and signal speed when used as a shunt aspect on polysilicon lines. In addition, WSi’s exceptional electromigration resistance– an unusual failing system in incorporated circuits– makes it specifically ideal for sophisticated semiconductor devices where existing thickness remains to increase with miniaturization. These detailed, useful homes, incorporated with the product’s amazing mechanical durability, establish Tungsten Disilicide as a really flexible solution for the most demanding technical difficulties across multiple industries.

3.Benefits and Drawbacks of Tungsten Disilicide
3.1 What are the Advantages of Tungsten Disilicide?
Tungsten Disilicide uses an excellent selection of benefits that make it irreplaceable in particular high-performance applications. Its most phenomenal benefit lies in the phenomenal high-temperature security, with a melting point going beyond 2165 ° C, that makes sure remarkable performance retention in thermally difficult atmospheres. This thermal effectiveness is complemented by outstanding oxidation resistance, creating a powerful mix for applications in oxidizing environments where various other products would swiftly break down. The product’s exceptional electrical performance– showing both satisfying conductivity and amazing electromigration resistance– enables its vital function in sophisticated microelectronic applications.
One more significant advantage of Tungsten Disilicide is its flexible processability into numerous morphological forms. Manufacturers can produce WSi2 as nano-powders, submicron powders, and micro-sized powders, enabling exact tailoring for certain application needs. This morphological flexibility makes it possible for maximized efficiency throughout varied applications ranging from mass conductive porcelains to specialized thin-film deposition processes. In addition, the product’s excellent chemical resistance to water and aqua regia supplies significant advantages in harsh environments. When these advantages are incorporated– thermal stability, oxidation resistance, electrical capability, morphological versatility, and chemical inertness– Tungsten Disilicide becomes a genuinely exceptional option for designers facing the toughest material needs in extreme operating problems.
3.2 What are the Disadvantages of Tungsten Disilicide?
Regardless of its remarkable performance characteristics, Tungsten Disilicide does present certain limitations that need cautious consideration in application style. One noteworthy downside involves its specific chemical sensitivity, particularly its sensitivity to assault by nitric acid-hydrofluoric acid mixtures. This susceptibility necessitates safety measures in semiconductor production, where such etchants are generally used. Furthermore, the intermediate oxidation state of tungsten (+2) produces a degree of redox sensitivity that must be handled with correct handling and storage space methods. This delicate equilibrium, while adding to a few of the material’s beneficial residential or commercial properties, also represents a criterion that requires meticulous control throughout processing.
The significant thickness of Tungsten Disilicide, while contributing to its mechanical effectiveness, may provide difficulties in weight-sensitive applications. This high mass thickness can limit its usage in aerospace and mobile electronics, where lightweight materials are typically preferred. Furthermore, Tungsten Disilicide calls for specialized storage problems– sealed in inert gas with anti-static product packaging and maintained in completely dry, awesome atmospheres– to stop undesirable pile and maintain its diffusion efficiency. These handling demands add complexity to the supply chain and might boost total execution costs. Nonetheless, for applications where its extraordinary high-temperature performance and electric functionality are called for, these limitations stand for convenient considerations rather than excessive barriers.
4.What are the Application Fields of Tungsten Disilicide?
The impressive properties of Tungsten Disilicide have actually enabled its successful application across diverse high-technology areas, establishing it as an absolutely transformative material in numerous industries. In microelectronics and semiconductor modern technology, WSi ₂ functions as a crucial product for electric get in touches with and interconnect applications, where its outstanding mix of electric conductivity and thermal stability ensures reliable device operation. The material’s premium performance as a shunt aspect on polysilicon lines significantly boosts conductivity and signal proliferation rate, resolving key obstacles in the incorporated circuit style. This application leverages the product’s superior electromigration resistance– a critical benefit as feature dimensions continue to be reduced and existing thicknesses alike boost.
In the rapidly progressing energy storage industry, nanocomposites including tungsten-based compounds have actually shown extraordinary potential in next-generation battery technologies and supercapacitors. These sophisticated product systems supply impressive electrochemical efficiency metrics, consisting of boosted academic capacity, expanded interlayer spacing, and increased chemical activity. The integration of tungsten silicides with graphene matrices properly addresses previous restrictions connected to electronic conductivity and volume expansion throughout charge-discharge cycles, developing innovative opportunities for future energy storage space options in applications ranging from mobile electronic devices to grid-scale storage systems.
Supplier
RBOSCHCO is a trusted global Tungsten Disilicide supplier & manufacturer with over 12 years experience in providing super high-quality chemicals and Nanomaterials. The company export to many countries, such as USA, Canada, Europe, UAE, South Africa,Tanzania,Kenya,Egypt,Nigeria,Cameroon,Uganda,Turkey,Mexico,Azerbaijan,Belgium,Cyprus,Czech Republic, Brazil, Chile, Argentina, Dubai, Japan, Korea, Vietnam, Thailand, Malaysia, Indonesia, Australia,Germany, France, Italy, Portugal etc. As a leading nanotechnology development manufacturer, RBOSCHCO dominates the market. Our professional work team provides perfect solutions to help improve the efficiency of various industries, create value, and easily cope with various challenges. If you are looking for Tungsten Disilicide, please feel free to contact us.
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